发明名称 THIN FILM TRANSISTOR SUBSTRATE AND DISPLAY DEVICE
摘要 Disclosed herein is a TFT substrate which exhibits good characteristic properties despite the omission of the barrier metal layer to be normally interposed between the source-drain electrodes and the semiconductor layer in the TFT. The TFT substrate permits sure and direct connection with the semiconductor layer of the TFT. The thin film transistor substrate has a substrate, a semiconductor layer and source-drain electrodes. The source-drain electrodes are composed of oxygen-containing layers and thin films of pure copper or a copper alloy. The oxygen-containing layer contains oxygen such that part or all of oxygen combines with silicon in the semiconductor layer. And, the thin films of pure copper or a copper alloy connect with the semiconductor layer of the thin film transistor through the oxygen-containing layers.
申请公布号 US2008315203(A1) 申请公布日期 2008.12.25
申请号 US20080126527 申请日期 2008.05.23
申请人 KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL LTD.) 发明人 HINO AYA;GOTOU HIROSHI
分类号 G02F1/1343;G02F1/1362;H01L21/28;H01L29/417;H01L29/786 主分类号 G02F1/1343
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