| 摘要 |
PROBLEM TO BE SOLVED: To provide a group 4 metal complex having excellent thermal stability and proper vapor pressure and suitable as a material for preparing a group 4 metal-containing thin film.SOLUTION: There is provided the group 4 metal complex represented by the general formula (1), where M represents a group 4 metal atom, R, R, Rand Reach represent independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, R, Rand Reach represent independently an alkyl group having 1 to 8 carbon atoms, R, Rand Reach represent independently an alkyl group having 1 to 6 carbon atoms or a di (alkyl having 1 to 3 carbon atoms) amino group.SELECTED DRAWING: None |
