发明名称 PLASMA PROCESSING METHOD AND APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To determine the end of preconditioning discharge after wet cleaning accurately by a versatile method. <P>SOLUTION: A plasma processing method includes a plasma processing container 101 equipped with an antenna electrode 102 and a bottom electrode 109 to place and hold a workpiece inside the processing container 101; a gas supply device for supplying a processing gas into the processing chamber 101; and an exhaust pump 116 for exhausting the gas inside the processing chamber via an exhaust valve 115. High-frequency power is supplied to the antenna electrode 102 via a matching circuit 105, and plasma is produced inside the processing container 101 wherein a magnetic field is formed by a magnetic field coil 107, and then a plasma processing is conducted on the workpiece 108 placed on the bottom electrode 109. This processing is repeated on a plurality of workpieces successively. In this case, the internal pressure of the processing container 101 is detected during the plasma processing. When the detected pressure decreases with an increase in plasma processing time and reaches a stable value, it is determined that preconditioning discharge is finished. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007324341(A) 申请公布日期 2007.12.13
申请号 JP20060152305 申请日期 2006.05.31
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IKEGAMI EIJI;IKUHARA SHIYOUJI;SHIMADA TAKESHI;KUWABARA KENICHI;ARASE TAKAO;MATSUMOTO TAKESHI
分类号 H01L21/3065 主分类号 H01L21/3065
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