OVERLAY OPERATION METHOD AND OVERLAY CONTROL METHOD

摘要

An overlay operation method and an overlay control method are disclosed. A first mark and a second mark are identified on a substrate, wherein the first mark and the second mark are formed by a process in combination with using a photomask. Next, a first measurement is performed to obtain an offset between the first mark and the second mark in a direction. Then, an operation is performed to judge whether the offset is in a range from a pre-determined offset minus a deviation to the pre-determined offset plus the deviation, wherein the pre-determined offset is determined by the photomask.

主权项

1. An overlay operation method, comprising:
identifying a first mark, a second mark and a third mark on a substrate, wherein the first mark and the second mark are formed by a first process in combination with using a first photomask, and the third mark is formed by a second process in combination with using a second photomask; performing a first measurement to obtain a first offset between the first mark and the second mark in a first direction, a second offset between the first mark and the third mark in the first direction, and a third offset between the second mark and the third mark in the first direction; and performing an operation to judge whether the first offset is in a first range from a first pre-determined offset minus a first deviation to the first pre-determined offset plus the first deviation, wherein the first pre-determined offset is determined by the first photomask.