Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine

摘要

A lithographic projection apparatus includes a substrate table configured to hold a substrate, a projection system configured to project a patterned beam onto a target portion of the substrate, liquid being provided to a space between the projection system and the substrate, and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. The shutter is separable from the remainder of the apparatus.