发明名称 VACUUM DEVICE, CHARGED-PARTICLE BEAM DEVICE, CONTAMINATION REMOVAL METHOD IN VACUUM DEVICE, AND CONTAMINATION REMOVAL METHOD IN CHARGED-PARTICLE BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To remove contaminations while using gas that surely causes a chemical reaction with hydrocarbon gas, is high in removal efficiency, can remove nonvolatile lubricant more efficiently, as compared with active oxygen gas or the like, even when the nonvolatile lubricant remains inside a vacuum device, and prevents members inside the vacuum device from being damaged heavily. SOLUTION: A charged-particle beam device has a sample chamber (vacuum device), a vacuum pump (TMP: turbo molecular pump), a gas inlet device for introducing XeF<SB>2</SB>which is a fluorine compound based gas, a change-over valve, a valve for release to the atmosphere, a flow-rate adjustment part, and a vacuum gauge. In order to remove contaminations due to remaining hydrocarbon gases, or the like, in the sample chamber, the change-over valve is operated so as to introduce fluorine compound gas (XeF<SB>2</SB>) into the sample chamber, together with the inert gas. A flow rate of fluorine compound gas (XeF<SB>2</SB>) is adjusted with the flow-rate adjustment part so as to maintain the atmospheric-pressure state inside the sample chamber at a substantially constant level. The flow-rate adjustment part is adjusted, according to a vacuum-degree measurement value to maintain the vacuum degree inside the sample chamber at an substantially constant level. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008091202(A) 申请公布日期 2008.04.17
申请号 JP20060270597 申请日期 2006.10.02
申请人 TOPCON CORP;NANO GEOMETRY KENKYUSHO:KK;JAPAN ADVANCED CHEMICALS:KK 发明人 HIGUCHI AKIRA;SHIBATA SHOJI;YASUHARA SHIGEO
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
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