| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film-deposition mask capable of preventing occlusion of slit-like apertures due to vibration and performing high-definition pattern deposition stably. <P>SOLUTION: A film-deposition mask 1 is configured by forming a plurality of slit-like apertures 4 in a metal foil 8. An aperture shape of at least one end of the slit-like aperture 4 is formed as a shape unsymmetrical to the center line O in the width direction of the slit-like aperture 4. <P>COPYRIGHT: (C)2012,JPO&INPIT |
