| 摘要 |
The present invention is an etching mask used for fabricating of the MEMS resonator including an oscillator which both edges are fixed to a base substance and vibrates to a vibrating direction, and an electrode which is fixed to a base substance by vibration is impossible in parallel for the oscillator, and is placed every one or more at the both sides of the oscillator. The etching mask includes a mask pattern 36 for oscillators which covers an oscillator formation scheduled region 34 on a conductive film 30 formed all over a sacrificial film which covers a region of the principal surface except both edges of the oscillator, and a mask pattern 40 for electrodes which covers an electrode formation scheduled region 38 on a conductive film. The width about a vibrating direction of a mask pattern for oscillators and a mask pattern for electrodes is made the same, and a gap between a mask pattern for oscillators and a mask pattern for electrodes and a gap between adjoining mask patterns for electrodes are made the same.
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