SOLUTION-PROCESSED SOLID ELECTROLYTIC LAYER DEVICE AND FABRICATION
摘要
<p>The present disclosure relates to a solid electrolyte device comprising an amorphous chalcogenide solid active electrolytic layer (3) located between first and second metallic layers (1, 4). The amorphous chalcogenide solid active electrolytic layer is prepared by obtaining a solution of a hydrazine-based precursor, to a metal chalcogenide; applying the solution onto a substrate; and thereafter annealing the precursor to convert the precursor to the amorphous metal chalcogenide. The present disclosure also relates to processes for fabricating the solid electrolyte device.</p>
申请公布号
WO2008155251(A1)
申请公布日期
2008.12.24
申请号
WO2008EP57167
申请日期
2008.06.09
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION;IBM UNITED KINGDOM LIMITED;GOPALAKRISHNAN, KAILASH;MITZI, DAVID, BRIAN;SHENOY, ROHIT, SUDHIR