SPUTTERING TARGET AND ANTI-ELECTROSTATIC THIN FILM USING THE SAME

摘要

PURPOSE: A sputtering target and a static electricity preventing film formed using the same are provided to improve the reflectivity of a static electricity preventing film while maintaining non-conductivity thereof. CONSTITUTION: A sputtering target comprises a plurality of first regions(10) formed of indium and a plurality of second regions(20) formed of titanium or/and chrome. The second regions occupy 5-30 weight% of the target. The first and second regions are alternately arranged in a horizontal or vertical direction.