发明名称 表面処理装置
摘要 A tank body 100 includes a liquid receiving part 2 for receiving processing solution Q applied to a plate-like work 10 and a liquid retaining part 4 for retaining liquids to be applied to the plate-like work 10 and a liquid outflowing part 6 for causing a flow of the processing solution Q which is spilled out of the liquid retaining part 4 and traveled down toward the plate-like work 10, wherein a tip 6a of the liquid outflowing part 6 is projected from a connecting part 5 connecting to the liquid retaining part 4 (or the liquid receiving part 2).
申请公布号 JP5986848(B2) 申请公布日期 2016.09.06
申请号 JP20120186448 申请日期 2012.08.27
申请人 上村工業株式会社 发明人 掘田 輝幸;山本 久光;内海 雅之;石嵜 隆浩
分类号 C23C18/31 主分类号 C23C18/31
代理机构 代理人
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