| 发明名称 |
PHOTOSENSITIVE ELEMENT, RESIST PATTERN FORMING METHOD USING SAME AND METHOD FOR MANUFACTURING PRINTED WIRING BOARD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive element which reduces the trailing amount of a resist pattern while having excellent resolution, and can form a resist pattern having a good shape of a lateral face thereof. <P>SOLUTION: The photosensitive element has on a resin film 10 a photosensitive layer 14 comprising a photosensitive resin composition containing (A) a binder polymer, (B) a photopolymerizable compound having an ethylenically unsaturated bond and (C) a photopolymerization initiator, wherein the component (A) has an acid number of 50-120 mgKOH/g and the resin film 10 has a haze of ≤1%. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
| 申请公布号 |
JP2006227206(A) |
申请公布日期 |
2006.08.31 |
| 申请号 |
JP20050039615 |
申请日期 |
2005.02.16 |
| 申请人 |
HITACHI CHEM CO LTD |
发明人 |
KUBOTA MASAO;TAKANO SHINJI |
| 分类号 |
G03F7/033;C08F265/06;G03F7/004;G03F7/027;G03F7/028;G03F7/09;G03F7/40;H05K3/06;H05K3/18 |
主分类号 |
G03F7/033 |
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