| 摘要 |
PURPOSE: A method and an apparatus for determining a laser correction tool parameter are provided to improve yield of a photolithography mask by individually designing a laser beam with regard to an error of each type. CONSTITUTION: A first persistent modification of a material(110) is induced by an interaction with a laser beam. The first persistent modification of the material is measured. A second persistent modification of the material is calculated by using a model which shows the persistent modification of the material with a laser beam parameter of a second set. A target function with the first persistent modification and the second persistent modification is set. A laser beam parameter which is not informed is determined by minimizing the target function. |
