METHOD AND MANUFACTURE OF MULTIPLE PHOTOMASK PATTERNS AND COMPUTER READABLE MEDIUM

摘要

This invention provides a method of modifying a photomask pattern for producing target pattern in a region where the first photomas pattern may be modified to produce a functional representation of a second photomask pattern and second photomask pattern may converted into a functional representation of a third photomask pattern. Further, this invention provides the method of manufacturing photomask and a semiconductor integrated circuit device or wafer in accordance with the photomask pattern determined. A comput readable medium and processor executing instructions for any of the methods and for storing or processing any of the patterns, representations, files or data structure are also described.