SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN

摘要

The present invention relates to salt which can secure a photoresist pattern with reduced line edge roughness. The salt is represented by chemical formula (I). In chemical formula (I), Q1 and Q2 independently represent a fluorine atom or a C1-C6 perfluoroalkyl group; R1 represents a C1-C12 alkyl group, and a methylene group in the alkyl group may be substituted for an oxygen atom or a carbonyl group; A1 represents a C2-C8 alkanediyl group; R2 represents a C5-C18 alicyclic hydrocarbon group, wherein a hydrogen atom in the alicyclic hydrocarbon group may be substituted for a hydroxyl group, and a methylene group in the alicyclic hydrocarbon group may be substituted for an oxygen atom or a carbonyl group, and the alicyclic hydrocarbon group may selectively have a ring-shaped ketal structure with a fluorine atom; and m represents an integer of 0, 1, 2 or 3.