发明名称 SYSTEM AND METHOD FOR MONITORING A SUBSTRATUM WITH REGARD TO DAMAGE AND/OR FOR PROTECTING A SUBSTRATUM FROM DAMAGE
摘要 The invention relates to a system for monitoring a substratum (1) with regard to damage and/or for protecting a substratum (1) from damage. The system comprises: an electrolytically active layer (4), which has a moisture-dependent electrical resistance; at least one electrode pair, the spaced-apart electrodes (3a, 3b) of which are connected to each other by means of the electrolytically active layer (4); and a measuring device, by means of which a property, in particular an electrical quantity of the electrolytically active layer (4) or of the electrodes (3a, 3b), can be measured by using electrodes (3a, 3b) of at least one electrode pair, in particular of each electrode pair, and/or a control device, by means of which a voltage can be applied to the electrodes (3a, 3b) of at least one electrode pair, in particular of each electrode pair. At least one of the electrodes (3a, 3b) of the at least one electrode pair is designed as a planar electrode in the electrolytically active layer (4), in particular the plane of said at least one electrode is oriented parallel to the surface of the substratum (1). The invention further relates to a method for producing a system for monitoring and/or for protecting a substratum, to a method for monitoring a substratum with regard to damage, and to a method for protecting a substratum from damage, in particular moisture damage and/or damage as a result of the penetration of harmful substances.
申请公布号 EP3069129(A1) 申请公布日期 2016.09.21
申请号 EP20140812405 申请日期 2014.11.13
申请人 RHEINISCH-WESTFÄLISCHE TECHNISCHE HOCHSCHULE AACHEN 发明人 MICHAEL, MICHAEL;REICHLING, KENJI;HELM, CHRISTIAN
分类号 G01N27/04;G01N33/38 主分类号 G01N27/04
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