发明名称 Internally cooled target assembly for magnetron sputtering
摘要 An internally cooled target assembly for use in a magnetron sputtering apparatus is provided. The internally cooled target assembly includes a cooling plate that is configured to promote highly turbulent coolant flow through the target assembly to achieve efficient and uniform target cooling. The volume of coolant required to cool the target assembly is minimized.
申请公布号 US5985115(A) 申请公布日期 1999.11.16
申请号 US19970832718 申请日期 1997.04.11
申请人 NOVELLUS SYSTEMS, INC. 发明人 HARTSOUGH, LARRY D.;HARRA, DAVID J.;COCHRAN, RONALD R.;JIANG, MINGWEI
分类号 H01J37/34;(IPC1-7):C23C14/34 主分类号 H01J37/34
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