SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

摘要

PURPOSE: A photoresist composition containing salt is provided to obtain a photoresist pattern with proper focus permission limit. CONSTITUTION: An acid generating agent contains salt of chemical formula I. A photoresist composition contains the acid generating agent and resin containing acid-unstable groups. The additionally composition contains a basic compound. A method for manufacturing a photoresist pattern comprises: a step of applying the photoresist composition on a substrate; a step of drying to form a photoresist film; a step of exposing the photoresist film to radiation; a step of baking the exposed photoresist film; and a step of developing the film.