| 发明名称 |
TEST STRUCTURES FOR DIELECTRIC RELIABILITY EVALUATIONS |
| 摘要 |
Methods and test structures for testing the reliability of a dielectric material. The test structure may include a first row of contacts and a line comprised of a conductor. The line is laterally spaced in a direction at a minimum distance from the first row of contacts. The test structure further includes a second row of contacts laterally spaced in the direction from the first row of contacts by a distance equal to two times a minimum pitch. The line is laterally positioned between the first row of contacts and the second row of contacts. |
| 申请公布号 |
US2016372389(A1) |
申请公布日期 |
2016.12.22 |
| 申请号 |
US201514742895 |
申请日期 |
2015.06.18 |
| 申请人 |
GLOBALFOUNDRIES INC. |
发明人 |
Brochu, JR. David G.;Dufresne Roger A.;Li Baozhen;Linder Barry P.;Stathis James H.;Wu Ernest Y. |
| 分类号 |
H01L21/66;H01L21/768;H01L29/66;G01R31/28;H01L21/28 |
主分类号 |
H01L21/66 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A structure for testing reliability of a dielectric material, the structure comprising:
a first row of contacts; a first linear feature comprised of a conductor, the first linear feature laterally spaced in a first direction at a minimum distance from the first row of contacts; and a second row of contacts laterally spaced in the first direction from the first row of contacts by a distance equal to two times a minimum pitch, wherein the first linear feature is laterally positioned between the first row of contacts and the second row of contacts. |
| 地址 |
GRAND CAYMAN KY |
