| 发明名称 |
METHOD AND SYSTEM FOR USING ION IMPLANTATION FOR TREATING A LOW-K DIELECTRIC FILM |
| 摘要 |
A system and method for forming a mechanically strengthened low-k dielectric film (20) on a substrate (10) includes using either spin-on-dielectric (SOD) techniques, or chemical vapor deposition (CVD) techniques to form a low-k dielectric film (20) on the substrate (10). An upper surface of the low-k dielectric film (20) is then treated in order to increase the film's mechanical strength, or reduce its dielectric constant. |
| 申请公布号 |
WO2004109756(A3) |
申请公布日期 |
2005.08.04 |
| 申请号 |
WO2004US15577 |
申请日期 |
2004.06.02 |
| 申请人 |
DUERKSEN, KENNETH;VIDUSEK, DAVID, A. |
发明人 |
DUERKSEN, KENNETH;VIDUSEK, DAVID, A. |
| 分类号 |
H01G4/236;H01L;H01L21/31;H01L21/3105;H01L21/312;H01L21/336;H01L21/469;H01L23/14 |
主分类号 |
H01G4/236 |
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