| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern exposure method and apparatus capable of forming periodic patterns of various shapes arranged in a work conveying direction in high throughput in simple equipment with suppressed equipment investment. <P>SOLUTION: A belt-like work 11 provided with a photosensitive layer is conveyed in a work conveying direction F at a work conveying speed V. A first illuminating section 30 illuminates a first photomask 29 in an exposure period T1 determined by the pattern to be transferred by exposure and synchronized with the work conveying speed V. A second illuminating section 66 illuminates a second photomask 65 in an exposure period T2 determined by the pattern to be transferred by exposure and synchronized with the work conveying speed V. The first photomask 29 and the second photomask 65 are disposed leaving a proximity gap from the belt-like work 11, and the respective mask patterns are transferred as a periodical pattern by exposure onto the belt-like work. <P>COPYRIGHT: (C)2007,JPO&INPIT |
