| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that can eliminate distortion in a mask while keeping the mask on a mask stage when stress acts on the mask to induce distortion upon sucking and holding the mask to the mask stage, that increases reproducibility of the shape of the mask kept on the stage and that can carry out exposure transfer with high accuracy. <P>SOLUTION: A mask stage 1 of a division sequential exposure apparatus PE has a pair of chucks 16 disposed corresponding to two sides opposing to each other of a mask M, each chuck having a plurality of box grooves 16b (16b1, 16b2, to 16b10). The plurality of box grooves 16b of each chuck 16 independently can impart sucking force to the mask M. <P>COPYRIGHT: (C)2008,JPO&INPIT |
