| 摘要 |
A method for cleaning a substrate processing apparatus, a substrate processing apparatus, and a recording medium with a program are provided to perform the optimum cleaning according to the kind of processes by performing the cleaning according to the kind of the processes. Cleaning is performed in a processing chamber cleaning after a specific process is performed on a substrate transferred into the processing chamber. The cleaning is performed by a cleaning recipe for a kind the process based on the cleaning recipe which is previously stored in a set information memory unit every kind of the process. The kinds of processes include transferring a target substrate into the processing chamber, and transferring a control substrate into the processing chamber to control a condition of the processing chamber.
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