发明名称 METHOD FOR GENERATING PROXIMITY CORRECTION FEATURES FOR LITHOGRAPHIC MASK PATTERN
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for imprementing edge bar and serif correction features synthesis processes. <P>SOLUTION: Hierarchical mask pattern data is converted into non-hierarchical data, and the data is then divided into many tiles. Edge bars are synthesized for all edges of individual tile, and serifs are synthesized with respect to all corners. The method for serif synthesis is performed by initially formatting tile date into a vertex representation 100 and synthesizing a positive serif for each convex corner and a negative vertex for each concave corner 101. The list of serifs is examined to filter out serifs that are too close to one another 102, the positive serifs are concatenated 103, and the negative serifs are geometrically subtracted from the modified tile data 104. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006343776(A) 申请公布日期 2006.12.21
申请号 JP20060230628 申请日期 2006.08.28
申请人 ASML MASKTOOLS BV 发明人 WAMPLER KURT E;LAIDIG THOMAS L
分类号 G03F1/00;G03F7/20;H01L21/027 主分类号 G03F1/00
代理机构 代理人
主权项
地址