METHOD OF FABRICATING GE OR SIGE/SI WAVEGUIDE OR PHOTONIC CRYSTAL STRUCTURES BY SELECTIVE GROWTH

摘要

A method of forming a low loss crystal quality waveguide is provided. The method includes providing a substrate and forming a dielectric layer on the substrate. A channel is formed by etching a portion of the dielectric layer. A selective growth of a Si Ge, or SiGe layer is performed in the area that defines the channel. Furthermore, the method includes thermally annealing the waveguide at a defined temperature range.