| 摘要 |
PROBLEM TO BE SOLVED: To exactly detect a defect candidate area and a line unevenness area or a point defect area, when the defect candidate area is overlapped with at least one part of the line unevenness area or the point defect area. SOLUTION: An inspection device detects the line unevenness area indicating a line unevenness defect in an objective image obtained from a substrate, and the point defect area indicating a point defect. A partial unevenness candidate area indicating a candidate of a partial unevenness defect, by binarizing the objective image with a prescribed threshold, in a partial unevenness detecting part 64. The defect candidate area and the line unevenness area or the point defect area are exactly detected in a determination part 66, by comparing an evaluation value about an intensity of the partial unevenness in the partial unevenness candidate area with an evaluation value about an intensity of the line unevenness defect in the line unevenness area line segment, or an evaluation value about an intensity of the point defect in the point defect area, and by determining the necessity of deletion of the partial unevenness candidate area, when the defect candidate area is overlapped with at least the one part of the line unevenness area or the point defect area. COPYRIGHT: (C)2008,JPO&INPIT
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