发明名称 PROCESS MANAGEMENT DEVICE, PROCESS MANAGEMENT METHOD, AND PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a process management device, a process management method, and a program, for accurately grasping a management state of a production process even in the case that quality characteristic values are partially biased dependently upon positions of products. <P>SOLUTION: A process management device 10 acquires quality characteristic values from a plurality of prescribed measurement positions of a substrate W subjected to a prescribed process by a production device 1, by a measuring instrument 11. A center device 13 operates a difference between an average value of quality characteristic values in respective measurement positions, which were acquired in the past, and newly acquired quality characteristic values and generates an R management chart on the basis of the difference value and outputs it to a monitor 15 as management information. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008027184(A) 申请公布日期 2008.02.07
申请号 JP20060198916 申请日期 2006.07.21
申请人 EPSON IMAGING DEVICES CORP 发明人 YAZAWA SATORU
分类号 G05B19/418 主分类号 G05B19/418
代理机构 代理人
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