发明名称 WAFER MANUFACTURING METHOD AND WAFER
摘要 PROBLEM TO BE SOLVED: To provide a wafer manufacturing method and a wafer, which enable singulation of oscillation elements from a wafer.SOLUTION: A wafer manufacturing method of the present embodiment includes: a first etching step of etching a crystal substrate 10 as a wafer to form a first region 20 which is a region corresponding to a thin part and simultaneously half-etching a region corresponding to an outer shape of an oscillation element 12 by a depth of the thin part; and a second etching step of etching the half-etched regions corresponding to the outer shapes to form outer shapes of individual oscillation elements 12.SELECTED DRAWING: Figure 7
申请公布号 JP2016174328(A) 申请公布日期 2016.09.29
申请号 JP20150054404 申请日期 2015.03.18
申请人 SEIKO EPSON CORP 发明人 YAMAMOTO YUSUKE
分类号 H03H3/02 主分类号 H03H3/02
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