发明名称 両面真空成膜方法
摘要 The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the fed substrate; forming a first material film on the first surface of the degassed substrate in a first film formation chamber; forming a second material film on the first material film in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the material films formed thereon; unrolling and feeding the taken up substrate from the first roll chamber in the direction, using a second surface opposite the first surface of the substrate as a surface for film formation; and repeating all the above treatments.
申请公布号 JP6049051(B2) 申请公布日期 2016.12.21
申请号 JP20120156280 申请日期 2012.07.12
申请人 日東電工株式会社 发明人 梨木 智剛;坂田 義昌;菅原 英男;家倉 健吉;濱田 明;伊藤 喜久;石橋 邦昭
分类号 C23C14/56;B32B9/00;B32B15/04;B32B15/20;C23C14/02;C23C14/06;C23C14/58 主分类号 C23C14/56
代理机构 代理人
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