PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a plasma processing device and a plasma processing method for performing plasma processing while controlling a temperature and capable of suppressing a temporal change of plasma processing results.SOLUTION: A plasma processing device comprises a processing chamber in which a sample is subjected to plasma processing using plasma, a high-frequency power supply which supplies high-frequency power for generating plasma; and a sample stand arranged with a temperature sensor and a heater therein and mounted with the sample. The plasma processing device further includes a control device which determines whether to start plasma processing on the basis of a value of the temperature sensor and an output value of the heater.SELECTED DRAWING: Figure 1