发明名称 Particle Beam Heating to Identify Defects
摘要 A charged particle beam, such as an electron beam or an ion beam, scans a device while a signal is applied to the device. As the particle beam scans, it locally heats the device, altering the local electrical characteristics of the device. The change in electrical characteristic is detected to and correlated to the position of the electron beam to localize a defect.
申请公布号 US2016370425(A1) 申请公布日期 2016.12.22
申请号 US201615075145 申请日期 2016.03.19
申请人 DCG Systems, Inc. 发明人 Stallcup Richard;Ukraintsev Vladimir;Berkmyre Mike;Lundquist Theodore
分类号 G01R31/307;G01R31/303;G01R1/30 主分类号 G01R31/307
代理机构 代理人
主权项 1. A method of locating resistive defects in a circuit, comprising: forcing a test current through a resistive defect in a circuit; scanning a charged particle beam across a portion of the circuit including the resistive defect, the charged particle beam locally heating the circuit at the impact point; detecting a change in resistivity of the resistive defect by detecting a change in the test current forced through the resistive defect as the resistive defect is heated by the charged particle beam; and determining the position of the resistive defect from the position of the charged particle beam in its scan when the change in resistivity is detected.
地址 Fremont CA US