| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a composition for forming an antireflection film having high etching durability characteristics, favorable antireflection ability for short wavelength light (absorptivity for short wavelength light) and high stability with time, and to provide an antireflection film using the composition. <P>SOLUTION: The composition for forming an antireflection film contains a siloxane compound having a light absorbing group and a crosslinked group, wherein the siloxane compound is sealed with a capping group. By sealing the siloxane compound with a capping group, stability with time can be improved without decreasing etching durability or antireflection ability. <P>COPYRIGHT: (C)2007,JPO&INPIT |
