| 摘要 |
The present invention provides a photomask for a display device, which shows improved transferability of a micropattern. The photomask for a display device comprises a transfer pattern including a light shielding portion, a phase shift portion and a light transmission portion by patterning each of a phase shift layer, an etching mask layer and a light-shielding layer on a transparent substrate by wet etching. The light shielding portion comprises the phase shift layer, the etching mask layer and the light shielding layer, stacked successively. The phase shift portion is the phase shift layer, or includes the phase shift layer and the etching mask layer, stacked successively. The light transmission portion is formed by exposing the transparent substrate surface. The phase shift layer comprises a chromium-containing material, and the etching mask layer comprises a material having resistance against an etching solution of the phase shift layer. The phase shift portion and the light transmission portion have a portion adjacent to each other. In addition, the phase shift portion and the light transmission portion have a phase difference of about 180 degrees, to the representative wavelength of the exposure light of the photomask. |
