发明名称 |
Wafer spin chuck and an etcher using the same |
摘要 |
A wafer spin chuck and an etcher using the same are provided. According to an aspect of the present invention, there is provide a wafer spin chuck device comprising: a spin body which spins a wafer; and a stationary body which holds the spin body and is under the spin body with a space between the spin body and the stationary body, wherein the stationary body includes a blocking unit which blocks the space with a fluid.
|
申请公布号 |
US8211269(B2) |
申请公布日期 |
2012.07.03 |
申请号 |
US201113190041 |
申请日期 |
2011.07.25 |
申请人 |
PARK JOO-JIB;KIM WOO-YOUNG;LEE WOO-SEOK;SEMES CO., LTD. |
发明人 |
PARK JOO-JIB;KIM WOO-YOUNG;LEE WOO-SEOK |
分类号 |
H01L21/30 |
主分类号 |
H01L21/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|