| 摘要 |
A photomask comprises: a light-transmissive substrate having a transfer unit and a frame unit; a light-transmissive area configured to form a transfer pattern by exposing the light-transmissive substrate in the transfer unit; and a light blocking area configured to surround the light-transmissive area in the transfer unit. The light blocking area comprises: a first light blocking area in which a first light blocking layer pattern is arranged on the light-transmissive substrate to surround the light-transmissive area along a light-transmissive area circumference; and a second light blocking area in which a plurality of second light blocking layer patterns are arranged on the light-transmissive substrate to surround the first light blocking area. |
