| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for forming insulating film, which can form an insulating film with excellent insulation and chemical resistance, and has a wide exposure margin in forming a pattern of the insulating film, and provide an insulating film formed using the photosensitive resin composition for forming insulating film, and an insulating film formation method using the photosensitive resin composition for forming insulating film.SOLUTION: In a photosensitive resin composition including (A) alkali-soluble resin, (B) photopolymerizable monomer, and (C) photopolymerization initiator, a compound of a specific structure is mixed, and as the (A) alkali-soluble resin, a resin comprising a structural unit derived from an unsaturated compound including a specified amount of epoxy group is used. |
