METALLIC PATTERN FORMING METHOD OF QUARTZ CRYSTAL OSCILLATOR, OUTLINE WORKING METHOD, AND EXPOSURE DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a metallic pattern forming method of a quartz crystal oscillator with which position precision of metallic films formed on a surface and a rear face of a crystal wafer is improved, and to provide an outline working method of the quartz crystal oscillator and an exposure device applied to them.

SOLUTION: A light transmitter whose surface and rear face are exposed to at least two parts is installed on the surface and the rear face of the crystal wafer 5 divided into individual crystal pieces. Surface markers 8b are formed on the light transmitter on the surface of the crystal wafer 5. Original edition markers 15b of the photomask 10 arranged on the rear face of the crystal wafer 5, and the surface markers 8b of the crystal wafer 5, are positioned while they are observed by a double focus optical system having a first focus system and a second focus system, whose focusing positions differ. The original edition marker 15a of the photomask 10 is exposed to a resist film 8 on the surface of the crystal wafer 5, and a metallic pattern 7 of the quartz crystal oscillator is formed.

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