| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner by which exposure of high resolution and high grade is achieved. <P>SOLUTION: The aligner comprises a projection optical system by which a pattern of a reticle is projected to a workpiece, and expose the workpiece through the projection optical system and a liquid by filling the space between the workpiece and a final optical element of the projection optical system with the liquid. The aligner further comprises a liquid holder which is arranged around the workpiece and has the surface at the same level as the surface of the workpiece to hold the liquid. The surface of the liquid holder is so processed that a first contact angle between the liquid and the surface of the workpiece is equal to or smaller than a second contact angle between the liquid and the surface of the liquid holder. <P>COPYRIGHT: (C)2007,JPO&INPIT |
