发明名称 ELECTROOPTICAL DEVICE AND METHOD FOR MANUFACTURING SAME, ELECTRONIC APPARATUS, AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To form a semiconductor layer composed of polysilicon in a display area, and to form a semiconductor layer composed of a flat single crystal silicon film in a peripheral area, in an electrooptical device such as a liquid crystal device. SOLUTION: The electrooptical device includes: a plurality of pixel sections aligned on the display area on a substrate; and a driving circuit containing a semiconductor device having a first semiconductor layer which has an SOI (Silicon On Insulator) structure composed of a first single crystal silicon film, and a second semiconductor layer which is composed of a second single crystal silicon film formed on the first semiconductor layer through epitaxial growth. The driving circuit is arranged in the peripheral area located around a periphery of the display area to drive the plurality of pixel sections. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007102054(A) 申请公布日期 2007.04.19
申请号 JP20050294429 申请日期 2005.10.07
申请人 SEIKO EPSON CORP 发明人 YASUKAWA MASAHIRO
分类号 G02F1/1345;G02F1/1368;G09F9/30;H01L21/20;H01L21/336;H01L29/786 主分类号 G02F1/1345
代理机构 代理人
主权项
地址