发明名称 |
Device manufacturing method |
摘要 |
A device manufacturing method, wherein a substrate (W) is provided, wherein a projection beam of radiation (PB) is provided using an illumination system (IL), wherein patterning means (MA) are used to impart the projection beam (PB) with a pattern in its cross-section, wherein the patterned beam of radiation (PB) is projected subsequently onto a number outer target portions (CO) of the substrate (W) before the patterned beam is projected onto inner target portions (CI) of the substrate (W), wherein each subsequent outer target portion (CO i+1 ) is spaced-apart from the outer target portion (COi) preceding that subsequent outer target portion (CO i+1 ).
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申请公布号 |
EP1860506(A1) |
申请公布日期 |
2007.11.28 |
申请号 |
EP20070116392 |
申请日期 |
2003.10.16 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
OTTENS, JOOST JEROEN;BOX, WILHELMUS JOSEPHUS;VAN ELP, JAN |
分类号 |
G03F7/20;H01J37/302;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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