发明名称 FILM FORMATION APPARATUS AND MANUFACTURING APPARATUS
摘要 PURPOSE: A film forming device and a manufacturing device are provided to shorten processing time per one substrate by forming a second electrode layer of an electro luminescence element and a protective layer in a lump. CONSTITUTION: A chamber is connected with a deposition chamber. A sputter chamber is connected with the chamber. The sputter chamber comprises a pair of targets and a substrate holder(15). The substrate holder purchases a plurality of substrates(13) between the pair of targets. The sputter chamber, the chamber, and the deposition chamber respectively have an exhaust unit. The chamber is connected with a mask stock room in which a mask is accepted. A protective layer is formed on the plurality of substrates.
申请公布号 KR20120081932(A) 申请公布日期 2012.07.20
申请号 KR20110143424 申请日期 2011.12.27
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI
分类号 H01L21/203;H01L21/20 主分类号 H01L21/203
代理机构 代理人
主权项
地址