| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a film which has uniform thickness from the surface and contains silicon dioxide as a main component, on the surface of a windshield of transport equipment having a curved surface and unevenness.SOLUTION: A method for modifying a surface of a resin substrate such as a windshield includes: irradiating a resin substrate 1 having a silicon polymer layer 3 formed by application of silicon polymer thereon with vacuum ultraviolet rays to form a film 4a containing silicon dioxide as a main component on the surface layer of the silicon polymer layer 3; then irradiating the film with near ultraviolet rays; and thereby increasing film thicknesses (4a and 4b) of the film containing the silicon dioxide as the main component.SELECTED DRAWING: Figure 1 |
