发明名称 |
METHOD FOR MANUFACTURING MASK OF SEMICONDUCTOR DEVICE |
摘要 |
<p>PURPOSE: A method for manufacturing a mask of a semiconductor device is provided to improve a DoF margin of a cutting mask by changing a partition mask into a dogbon pattern shape. CONSTITUTION: A first sensitive film pattern of a dogbon shape is formed. Spacers are formed at the sidewall of the first sensitive film pattern. The spacers comprise a nitride film. A second sensitive film pattern is formed between the spacers. The second sensitive film pattern is a negative sensitive film. The spacers are eliminated. A first pattern is formed by etching the second sensitive film pattern by using a cutting mask as an etching mask. An isolation pattern(270) is formed by etching the first pattern by using a pad mask as the etching mask.</p> |
申请公布号 |
KR20120081653(A) |
申请公布日期 |
2012.07.20 |
申请号 |
KR20100124527 |
申请日期 |
2010.12.07 |
申请人 |
SK HYNIX INC. |
发明人 |
PARK, JONG CHEON;CHO, BYUNG UG |
分类号 |
H01L21/027;G03F1/76 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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