| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum treatment apparatus that can simplify structures of a conveyance mechanism and a chamber and also stably convey a glass substrate.SOLUTION: In a vacuum treatment device that comprises a conveyance mechanism 15 having a substrate holder 14 holding a glass substrate 11 detachably and a chamber 13 in which the glass substrate 11 is treated in a vacuum state, and is configured to transfer the substrate holder 14 by the conveyance mechanism 15 so as to carry the glass substrate 11 in the chamber 13 and to carry the glass substrate 11 out of the chamber 13, the conveyance mechanism 15 comprises pulleys 17, 18 arranged vertically at a plurality of places along a transfer direction of the substrate holder 14, and driven while guiding the substrate holder 14, and a shaft 21 extending in the transfer direction is installed in the substrate holder 14, and then made to abut on the pulleys 17, 18 in the vertical arrangement so as to tilt the substrate holder 14 to the pulleys 17, 18 in the vertical arrangement.SELECTED DRAWING: Figure 1 |
