发明名称 FILM FORMING METHOD AND FILM FORMING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a film forming method by which a film having uniform thickness is efficiently formed, and a film forming apparatus capable of using the film forming method. SOLUTION: The film forming method includes: a first step for supplying droplets 161 of a liquid material containing a film forming material and a solvent on a base material 1 to form a liquid coating film 2 into a prescribed pattern, transporting the base material 1 on which the liquid coating film 2 is formed onto a base material stage 13 in the chamber 11 by a base material transporting part 17 and reducing the pressure of the atmosphere around the liquid coating film 2 by an exhaust pump 12 while cooling the liquid coating film 2 by a cooling means 14 to primarily dry the liquid coating film; and a second step for obtaining a secondarily dried film by heating the primarily dried liquid coating film 2 by a heating part 15. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2007319821(A) 申请公布日期 2007.12.13
申请号 JP20060155015 申请日期 2006.06.02
申请人 SEIKO EPSON CORP 发明人 GOMI KAZUHIRO
分类号 B05D3/02;B05C9/12;B05C9/14;B05D3/00 主分类号 B05D3/02
代理机构 代理人
主权项
地址