| 摘要 |
PROBLEM TO BE SOLVED: To provide satisfactorily dry a substrate surface while preventing the generation of fall of a pattern formed on the substrate surface in a substrate processing apparatus and a substrate processing method for drying the substrate surface wetted with a liquid using steam of an organic solvent such as IPA (isopropyl alcohol). SOLUTION: After rinse processing, a bottom surface 43 as a substrate facing surface of a facing member 4 formed of a porous material is disposed with a space while facing a rinse solution adhering on a substrate surface Wf. Then, an organic solvent gas containing steam of an organic solvent dissolved in the rinse solution and reducing surface tension is supplied to the substantial center portion of a top surface 41 of the facing member 4. The organic solvent gas supplied to the facing member 4 spreads inside the facing member 4 while dispersing, and is uniformly discharged from the entire bottom surface 43 of the facing member 4 toward the rinse solution adhering on the substrate surface Wf. In this way, the organic solvent is uniformly dissolved in each part of the rinse solution, and the surface tension is uniformly lowered. COPYRIGHT: (C)2008,JPO&INPIT
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