发明名称 |
Topical treatment of radiation dermatitis using hamelia patens |
摘要 |
Topical compositions are provided useful for treating radiation dermatitis. The compositions comprise an extract of the plant Hamelia patens and are applied topically to skin having radiation dermatitis to relieve symptoms thereof. |
申请公布号 |
US9345736(B2) |
申请公布日期 |
2016.05.24 |
申请号 |
US201313815957 |
申请日期 |
2013.03.16 |
申请人 |
BERRY PHARMACEUTICALS, L.L.C. |
发明人 |
Berry Don Wayne |
分类号 |
A61K36/74;A61K9/06;A61K8/46;A61K8/55;A61K8/97;A61K9/00;A61K9/107;A61K31/135;A61K31/19;A61K31/404;A61K31/438;A61K31/575;A61K31/7048;A61Q19/00 |
主分类号 |
A61K36/74 |
代理机构 |
|
代理人 |
Whewell Chris |
主权项 |
1. A method for alleviating symptoms induced by external beam irradiation resulting from treating cancers with radiation on the skin of a human subject, which method comprises topically applying a composition containing a Hamelia patens extract to an affected skin area of said subject in an effective amount and frequency for alleviation of said symptoms. |
地址 |
Georgetown TX US |