SUBSTRATE STRUCTURE, SEMICONDUCTOR STRUCTURE AND METHOD FOR FABRICATING THE SAME

摘要

A substrate structure for a micro electro mechanical system (MEMS) device, a semiconductor structure and a method for fabricating the same are provided. In various embodiments, the substrate structure for the MEMS device includes a substrate, the MEMS device, and an anti-stiction layer. The MEMS device is over the substrate. The anti-stiction layer is on a surface of the MEMS device, and includes amorphous carbon, polytetrafluoroethene, hafnium oxide, tantalum oxide, zirconium oxide, or a combination thereof.

主权项

1. A substrate structure for a micro electro mechanical system (MEMS) device, comprising:
a substrate; the MEMS device over the substrate; and an anti-stiction layer on a surface of the MEMS device and comprising a material selected from a group consisting of: amorphous carbon, polytetrafluoroethene, hafnium oxide, tantalum oxide, zirconium oxide, and a combination thereof.