| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus and method for producing a thin film, which is excellent in productivity, and can subject a surface of a substrate to oxidization treatment and also can form a thin-film on the surface thereof, continuously and stably in a single vacuum container without providing a differential pressure structure, while conveying a belt-like substrate. <P>SOLUTION: The apparatus for producing the thin film on the surface of the belt-like substrate in vacuum includes: a conveying mechanism for conveying the substrate 4; a thin film-forming unit for forming the thin film in a first thin film-forming region 15a on the surface of the substrate held by the conveying mechanism, wherein the thin film-forming unit is arranged facing the first thin film-forming region and includes a vapor deposition source 3a for housing a raw vapor deposition material; a first gas nozzle 17a, arranged ahead of the first thin film-forming region 15a in a conveying path of the substrate, for supplying an ozone-containing gas to the surface of the substrate; and the vacuum container for housing the conveying mechanism, the thin film-forming unit, and the first gas nozzle. <P>COPYRIGHT: (C)2012,JPO&INPIT |
