Textured silicon liners in substrate processing systems

摘要

Substrate processing systems, such as ion implantation systems, deposition systems and etch systems, having textured silicon liners are disclosed. The silicon liners are textured using a chemical treatment that produces small features, referred to as micropyramids, which may be less than 20 micrometers in height. Despite the fact that these micropyramids are much smaller than the textured features commonly found in graphite liners, the textured silicon is able to hold deposited coatings and resist flaking. Methods for performing preventative maintenance on these substrate processing systems are also disclosed.

主权项

1. An ion implantation system, comprising:
an ion source; a process chamber in which a substrate is disposed; and a silicon liner, disposed within said system, where a surface of said silicon liner is textured, wherein said textured surface of said silicon liner comprises micropyramids having a height of less than 20 micrometers.